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  3. Plasma Processes for Semiconductor Fabrication
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  • Publisher:
    Cambridge University Press
    Publication date:
    01 October 2009
    28 January 1999
    ISBN:
    9780511529511
    9780521591751
    9780521018005
    DOI:
    https://doi.org/10.1017/CBO9780511529511
    Dimensions:
    (253 x 177 mm)
    Weight & Pages:
    0.62kg, 232 Pages
    Dimensions:
    (253 x 177 mm)
    Weight & Pages:
    0.414kg, 232 Pages
    • Subjects:
    Physics and Astronomy, Engineering, Electronic, Optoelectronic Devices, and Nanotechnology, Plasma Physics and Fusion Physics
    Series:
    Cambridge Studies in Semiconductor Physics and Microelectronic Engineering (8)
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    Subjects:
    Physics and Astronomy, Engineering, Electronic, Optoelectronic Devices, and Nanotechnology, Plasma Physics and Fusion Physics
    Series:
    Cambridge Studies in Semiconductor Physics and Microelectronic Engineering (8)
    Information

    Book description

    Plasma processing is a central technique in the fabrication of semiconductor devices. This self-contained book provides an up-to-date description of plasma etching and deposition in semiconductor fabrication. It presents the basic physics and chemistry of these processes, and shows how they can be accurately modelled. The author begins with an overview of plasma reactors, and discusses the various models for understanding plasma processes. He then covers plasma chemistry, and describes in detail the modelling of complex plasma systems, with reference to experimental results. The book closes with a useful glossary of technical terms. No prior knowledge of plasma physics is assumed in the book. It contains many exercises and will serve as an ideal introduction to plasma processing and technology for graduate students of electrical engineering and materials science. It will also be a useful reference for practising engineers in the semiconductor industry.

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