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Application of Graded Multilayer Optics in X-Ray Diffraction

Published online by Cambridge University Press:  06 March 2019

M. Schuster and
H. Göbel
M. Schuster
Affiliation:
Siemens AG, Corporate Research and Development, ZFETMR 3, Otto-Hahn-Ring 6, D-81739 Munich. Germany
H. Göbel
Affiliation:
Siemens AG, Corporate Research and Development, ZFETMR 3, Otto-Hahn-Ring 6, D-81739 Munich. Germany
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Abstract

Periodic multilayers are ideally suited as high-reflectivity and wide-bandwidth Bragg reflectors. Their period can be matched laterally to the incidence angle so that for all points on the reflector, Bragg reflection is obtained for the same wavelength. Three major types of laterally graded multilayer optics were appJied to X-ray diffraction: (i) Parabolically curved multilayer mirrors were used to convert divergent radiation emerging from an X-ray source into a parallel beam. The parallel beam was applied in powder diffraction, grazing incidence diffraction, reflectometry, high-resolution diffraction, and protein crystallography, (ii) Elliptically curved multilayer mirrors focused the divergent radiation from the source into a line on the sample or detector. The high brilliance and small dimension of the focused beam make this mirror type suited for transmission diffractometry of capillary and fiber specimens, (iii) Planar multilayer mirrors were employed in divergent-beam optics. In Bragg-Brentano diffractometers, this mirror type can serve as a compact incident-beam monochromator for removing Kβ lines and Bremsstrahlung.

Information

Type
Research Article
Information
Advances in X-Ray Analysis , Volume 39: Forty-Fourth Annual Conference on Applications of X-ray Analysis, July 31 - August 4, 1995 , 1995, pp. 57 - 71
Copyright
Copyright © International Centre for Diffraction Data 1995

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References

/1/ Franks, A., Proc. Phys. Soc. London Sect. B68 (1955) 1054–1064.Google Scholar
/2/ Kirkpatrick, P. and Baez, A. V., J. Opt. Soc. Am. 38 (1948)766–774.Google Scholar
/3/ MacGillavry, C. H., Rieck, G. D., and Longsdale, K., International Tables for X-Ray Crystallography vol. 3 (Kynoch Press, Birmingham, 1968), pp. 79–86.Google Scholar
/4/ Hastings, J. B., Thomlinson, W., and Cox, D. E., J. Appl. Cryst. 17 (1984) 85–89.Google Scholar
/5/ Parrish, W. and Hart, M., Trans. Am. Crystallogr. Assoc. 21 (1985) 51–55.Google Scholar
/6/ Underwood, J. H. and Barbee, T. W. Jr., Proc. Topical Conf. on Low Energy X-Ray Diagnostics (Monterey, California, USA) June 8-10, 1981, in A1P Conf. Proc. (USA) 75 (1981) 170–178.Google Scholar
/7/ Henke, B. L., Adv. X-Ray Anal. 8 (1965) 430–440.Google Scholar
/8/ Spiller, E., Appl. Phys. Lett. 20 (1972) 365.Google Scholar
/9/ Joensen, K. D., Hoghaj, P., Christensen, F., Gorenstein, P., Susini, J., Ziegler, E., and Wood, J., SPIE 2011 (1994).Google Scholar
/10/ Marshall, G. F., SPIE 563 (1985).Google Scholar
/11/ Marshall, G. F., Optical Engineering 25 (1986) 922–932.Google Scholar
/12/ Göbel, H., 43rd Annual Denver Conference on Applications of X-Ray Analysis (Steamboat Springs, Colorado, USA) August 1-5, 1994, Abstracts.Google Scholar
/13/ Göbel, H., Siemens AG, German Patent Application P 44 07 278. 3.Google Scholar
/14/ Schuster, M. and Göbel, H., J. Phys. D; Appl. Phys. 28 (1995) A270-A275.Google Scholar
/15/ Schuster, M. and Göbel, H., to be published (1996).Google Scholar
/16/ Schuster, M., Phillips, J., and Göbel, H., to be published (1996).Google Scholar
/17/ Grupido, N. and Gutmaa Osmic, G., Inc. (Troy, Michigan, USA). The first parabolic reflectors for parallel-beam applications were manufactured to Siemens’ specifications by Osmic in 1993. The design was based on the feasibilty of layer deposition at Osmic and the geometrical boundary requirements of Siemens’ diffraction system. Modified gradings were produced since then and bent to the different monochromator figures.Google Scholar
/18/ Underwood, J. H., Rev. Sci. Instrum. 57 (1986) 2119–2123.Google Scholar
/19/ Wilson, A. J. C., Mathematical Theory of X-Ray Powder Diffraction (Philips Technical Library, Eindhoven, The Netherlands, 1963) pp. 14, 16, and38.Google Scholar
/20/ Blanton, T. N., Huang, T. C., Toraya, H., Hubbard, C. R., Robie, S. B., Louër, D.. Göbel, H. E., Will, G., Gilles, R., and Raftery, T., Powder Diffraction 10 (1995) 91–95.Google Scholar
/21/ Brügemann, L., Siemens Application Note 14 (Siemens, Karlsruhe, Germany, 1995).Google Scholar
/22/ Göbel, H., ACA Annual Meeting (Pittsburgh, Pennsylvania, USA) August 9-14, 1992, Book of Abstracts vol. 20, p. 34.Google Scholar
/23/ Göbel, H., US Patent 5 373 544.Google Scholar
/24/ Johansson, T., Natuiwiss. 20 (1932) 758–759.Google Scholar
/25/ Johansson, T., Z. Phys. 82 (1933) 507–528.Google Scholar
/26/ Dietsch, R. and Mai, H., Fraunhofer Gesellschaft IWS (Dresden, Germany).Google Scholar
/27/ Dietsch, R., Th. Holz, Mai, H., Schöneich, B., Völlmar, S., Krawietz, R., Wehner, B., and Scholz, R., in Structure and Properties of Multilayered Thin Films, Eds. Nguyen, T. D., Larison, B. M., Clemens, B. M., Sato, K., and Shin, S. C.. Proc. Materials Research Soc. Symposium (San Francisco, California, USA) April 17-21, 1995.Google Scholar