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Stress-Depth Profiles in Magnetron Sputtered Mo Films Using Grazing Incidence X-Ray Diffraction (GIXD)

Published online by Cambridge University Press:  06 March 2019

B. L. Ballard
Affiliation:
University of Denver, Engineering Department Denver, Colorado 80208
P. K. Predecki
Affiliation:
University of Denver, Engineering Department Denver, Colorado 80208
D. N. Braski
Affiliation:
HTML, Oak Ridge National Laboratory, Oak Ridge Tennessee, 37831
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Abstract

Intrinsic stresses as a function of σ, the 1/e penetration depth were measured for a smooth, 1μm thick, fine grained, cylindrical post magnetron sputtered molybdenum film deposited on a vycor glass substrate in the dynamic deposition mode. Using grazing incidence diffraction and the Mo (321) reflection, lattice spacing profiles were determined for τ values from 200-4400 Å. The in-plane intrinsic stresses parallel and perpendicular to the post axis were determined employing the ϕ-integral method and assuming elastic isotropy. The results were related to the surface structure and composition profiles via atomic force microscopy (AFM) and auger electron spectroscopy (AES) respectively.

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Type
Research Article
Copyright
Copyright © International Centre for Diffraction Data 1993

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