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X-Ray Diffraction Analysis of Simultaneous Changes in Stress and Dislocation Densities in Thin Films

Published online by Cambridge University Press:  06 March 2019

A. C. Vermeulen,
R. Delhez,
Th.H. de Keijser and
E. J. Mittemeijer
A. C. Vermeulen
Affiliation:
Laboratory of Materials Science, Delft University of Technology, Rotterdamseweg 137, 2628 AL Delft, The Netherlands
R. Delhez
Affiliation:
Laboratory of Materials Science, Delft University of Technology, Rotterdamseweg 137, 2628 AL Delft, The Netherlands
Th.H. de Keijser
Affiliation:
Laboratory of Materials Science, Delft University of Technology, Rotterdamseweg 137, 2628 AL Delft, The Netherlands
E. J. Mittemeijer
Affiliation:
Laboratory of Materials Science, Delft University of Technology, Rotterdamseweg 137, 2628 AL Delft, The Netherlands
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A method has heen developed to determine the dislocation configuration in a polycrystalline specimen from the direction dependence of line broadening. The method is based on an analytical expression for the integral breadth due to microstrain from sets of parallel edge and/or screw dislocations on the specific slip systems. Analysis of the x-ray-diffraction measurements obtained from poly crystalline aluminium layers, deposited onto silicon wafers and subsequently annealed and cooled to room temperature, shows unequal densities and unequal changes of densities of dislocations with the Burgers vector parallel and with the Burgers vector inclined with respect to the surface of the layer. Stress relaxation and dislocation annihilation occur at room temperature. A model was developed to describe the dependency of the decrease of macrostress on the decrease of the dislocation density.

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Type
Research Article
Information
Advances in X-Ray Analysis , Volume 39: Forty-Fourth Annual Conference on Applications of X-ray Analysis, July 31 - August 4, 1995 , 1995, pp. 195 - 210
Copyright
Copyright © International Centre for Diffraction Data 1995

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