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Interdiffusion in Ni80Fe20/Mo magnetic multilayers prepared by magnetron sputtering

Published online by Cambridge University Press:  31 January 2011

X. Y. Zhang,
Y. F. Xu,
M. L. Yan,
L. M. Chao,
M. Zhang,
J. H. Zhao,
W. Y. Lai and
W. K. Wang
X. Y. Zhang
Affiliation:
Institute of Physics, Chinese Academy of Sciences, Beijing 100080, and College of Materials Science and Engineering, Yanshan University, Qinhuangdao 066000, People's Republic of China
Y. F. Xu
Affiliation:
Institute of Physics, Chinese Academy of Sciences, Beijing 100080, People's Republic of China
M. L. Yan
Affiliation:
State Key Laboratory of Magnetism, Institute of Physics, Chinese Academy of Sciences, Beijing 100080, People's Republic of China
L. M. Chao
Affiliation:
Institute of Physics, Chinese Academy of Sciences, Beijing 100080, People's Republic of China
M. Zhang
Affiliation:
Institute of Physics, Chinese Academy of Sciences, Beijing 100080, People's Republic of China
J. H. Zhao
Affiliation:
Institute of Physics, Chinese Academy of Sciences, Beijing 100080, People's Republic of China
W. Y. Lai
Affiliation:
State Key Laboratory of Magnetism, Institute of Physics, Chinese Academy of Sciences, Beijing 100080, People's Republic of China
W. K. Wang
Affiliation:
Institute of Physics, Chinese Academy of Sciences, Beijing 100080, and College of Materials Science and Engineering, Yanshan University, Qinhuangdao 066000, People's Republic of China
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Abstract

The interdiffusion in Ni80Fe20/Mo magnetic multilayers with a repeat length of 3.4 nm has been investigated using x-ray diffraction (XRD) technology. The multilayers have been fabricated by using a magnetron sputtering system. The decay with annealing time in the intensity of the first-order x-ray satellite peak arising from the composition modulation was used to determine the effective interdiffusion coefficient Dλ. As the annealing temperature is below 483 K, the interdiffusion is found to be relatively slow (Dλ < 8.88 × 10−25 m2/s). This result suggests that the Ni80Fe20/Mo multilayers have a strong resistance to the atomic interdiffusion between sublayers. The diffusivities over the temperature range 343–683 K have an Arrhenius-type temperature dependence with a pre-exponential factor D0 = (4.02 ± 1.21) × 10−22 m2/s and an activation enthalpy of about 0.26 ± 0.08 eV. The much lower activation enthalpy is attributed to the coherence strains existing in the multilayers.

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Articles
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Journal of Materials Research , Volume 14 , Issue 3 , March 1999, pp. 984 - 989
Copyright
Copyright © Materials Research Society 1999

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