Hostname: page-component-7b7567c8c-2rsb6 Total loading time: 0 Render date: 2026-11-12T06:20:26.588Z Has data issue: false hasContentIssue false
  • English
  • Français

The study on charge-density distribution in TiAl by quantitative electron crystallography method

Published online by Cambridge University Press:  03 March 2011

Yu Miao,
Jing Zhu,
X.W. Lin and
W.J. Jiang
Yu Miao
Affiliation:
Department of Physics, Central Iron and Steel Research Institute, Beijing 100081, People's Republic of China
Jing Zhu
Affiliation:
Department of Physics, Central Iron and Steel Research Institute, Beijing 100081, People's Republic of China
X.W. Lin
Affiliation:
Department of Physics, Central Iron and Steel Research Institute, Beijing 100081, People's Republic of China
W.J. Jiang
Affiliation:
National Laboratory of Metal Matrix Composite Materials, Shanghai Jiao Tong University, Shanghai 200030, People's Republic of China
Get access

Abstract

Structure factors of μ-TiAl equiaxed grain in TiAl duplex intermetallic compound before and after V-alloying were measured by the quantitative electron crystallography method. Then the structure factors were transferred into charge-density distributions of real space. Comparing the charge-density distributions in γ-TiAl with those in V-alloyed γ-TiAl, it was found that V-alloying with the optimum amount decreases the electronic charge density in the Ti-Ti interatomic bond, and increases the electronic charge density in the Al-Al interatomic bond and Ti-Al interatomic bond. Thus, the anisotropy of charge-density distribution in γ-TiAl equiaxed grain is reduced.

Information

Type
Articles
Information
Journal of Materials Research , Volume 10 , Issue 8 , August 1995, pp. 1913 - 1916
Copyright
Copyright © Materials Research Society 1995

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

Article purchase

Temporarily unavailable

References

REFERENCES

1Spence, J. C.H. and Zuo, J. M., Electron Microdiffraction (Plenum Press, New York, 1992).CrossRefGoogle Scholar
2Gjønnes, J. and Høier, R., Acta Crystallogr, A 27, 313 (1971).CrossRefGoogle Scholar
3Miao, Yu, Master Thesis, Central Iron and Steel Research Institute, Beijing, China (1993, Chinese Edition).Google Scholar
4Fletcher, R., The Computer Journal 13, 317 (1970).CrossRefGoogle Scholar
5Anisimov, V. I., Fiz. Met. Metalloved. [Phys. Met. Metallogr. (USSR)] 63, 414 (1987).Google Scholar