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Thin films with nanometer-scale pillar microstructure

Published online by Cambridge University Press:  31 January 2011

K. Robbie,
C. Shafai and
M. J. Brett
K. Robbie
Affiliation:
Department of Physics, Queen's University, Kingston, Ontario, Canada K7L 3N6
C. Shafai
Affiliation:
Department of Electrical and Computer Engineering, University of Alberta, Edmonton, Alberta, Canada, T6G 2G7
M. J. Brett
Affiliation:
Department of Electrical and Computer Engineering, University of Alberta, Edmonton, Alberta, Canada, T6G 2G7
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Abstract

Thin films possessing microstructure composed of isolated vertical pillars were deposited by glancing angle deposition (GLAD) without the need for subsequent etch processing. The GLAD technique uses substrate rotation and oblique angle flux incidence to deposit a porous columnar thin film with engineered microstructures. Thin films with a pillar microstructure were fabricated from a variety of metals, metal oxides and fluorides, and semiconductors. The rate and incident angle of vapor flux, as well as the substrate rotation speed during deposition, were found to critically affect pillar microstructure. Thin films with pillar diameters and densities as low as 30 nm and 3 pillars per μm2, respectively, were deposited. The low stress, high surface area, and porous nature of these films suggests use of pillar microstructure films in optical, chemical, biological, mechanical, magnetic, and electrical applications.

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Type
Articles
Information
Journal of Materials Research , Volume 14 , Issue 7 , July 1999, pp. 3158 - 3163
Copyright
Copyright © Materials Research Society 1999

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