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Interdiffusion reactions in Ni/Ta multilayers studied by x-ray diffraction

Published online by Cambridge University Press:  31 January 2011

Mark A. Hollanders,
Caroline G. Duterloo,
Barend J. Thijsse and
Eric J. Mittemeijer
Mark A. Hollanders
Affiliation:
Laboratory of Metallurgy, Delft University of Technology, Rotterdamseweg 137, 2628 AL Delft, The Netherland
Caroline G. Duterloo
Affiliation:
Laboratory of Metallurgy, Delft University of Technology, Rotterdamseweg 137, 2628 AL Delft, The Netherland
Barend J. Thijsse
Affiliation:
Laboratory of Metallurgy, Delft University of Technology, Rotterdamseweg 137, 2628 AL Delft, The Netherland
Eric J. Mittemeijer
Affiliation:
Laboratory of Metallurgy, Delft University of Technology, Rotterdamseweg 137, 2628 AL Delft, The Netherland
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Abstract

Diffusion-induced phase transformations were studied in Ni/β-Ta multilayers between 523 K and 823 K, primarily using x-ray diffraction. The multilayers had a modulation length, A, of 20.3 nm and a composition of Ni48Ta52. They were polycrystalline without coherency between the Ni and Ta sublayers. Upon annealing at relatively low temperatures (up to 723 K) Ta dissolved in crystalline Ni, concurrently with the formation of an amorphous phase. The interdiffusion reactions did not take place only at the Ni/Ta interfaces, but also along the grain boundaries in the sublayers. The chemical diffusion coefficient in the amorphous phase was determined at 673 K, using a previously developed method. The results were compared with experiments on Ni/Ti multilayers, which show similar reactions. At 723 K and higher temperatures the fcc (Ni, Ta) solid solution transformed into the stable Ni3Ta compound.

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Articles
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Journal of Materials Research , Volume 6 , Issue 9 , September 1991, pp. 1862 - 1873
Copyright
Copyright © Materials Research Society 1991

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