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Solid-state amorphization in Al–Pt thin films

Published online by Cambridge University Press:  31 January 2011

J. M. Legresy,
B. Blanpain and
J. W. Mayer
J. M. Legresy
Affiliation:
Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853
B. Blanpain
Affiliation:
Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853
J. W. Mayer
Affiliation:
Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853
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Abstract

Solid-state amorphization is reported to occur in aluminum-platinum thin films. A uniform amorphous alloy layer was observed at the interface between aluminum and platinum layers for electron beam evaporated samples in an as-deposited state. For a pure aluminum overlayer deposited on top of a coevaporated Al–Pt amorphous alloy, the aluminum dissolves into the amorphous phase leading to a fully amorphous sample. In this last case the amorphization is nonuniform upon low-temperature anneals (T < ≃2 200 °C) and gives rise to hole formation in the aluminum overlayer. Direct observations of this phenomenon during in situ annealing of the thin films in a transmission electron microscope were carried out.

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Type
Articles
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Journal of Materials Research , Volume 3 , Issue 5 , October 1988, pp. 884 - 889
Copyright
Copyright © Materials Research Society 1988

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References

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