Hostname: page-component-74656f9884-j7cmm Total loading time: 0 Render date: 2026-11-10T04:29:31.798Z Has data issue: false hasContentIssue false
  • English
  • Français

Linear laser plasma toward large-sized uniform soft X-ray source

Published online by Cambridge University Press:  09 March 2009

Xiaofang Wang ,
Zhizhan Xu ,
Shisheng Chen ,
Aidi Qian ,
Yueling Li ,
Pinzhong Fan  and
Lihuang Lin
Xiaofang Wang
Affiliation:
Shanghai Institute of Optics and Fine Mechanics, Academia Sinica, P.O. Box 800–211, Shanghai 201800, Peoples Republic of China
Zhizhan Xu
Affiliation:
Shanghai Institute of Optics and Fine Mechanics, Academia Sinica, P.O. Box 800–211, Shanghai 201800, Peoples Republic of China
Shisheng Chen
Affiliation:
Shanghai Institute of Optics and Fine Mechanics, Academia Sinica, P.O. Box 800–211, Shanghai 201800, Peoples Republic of China
Aidi Qian
Affiliation:
Shanghai Institute of Optics and Fine Mechanics, Academia Sinica, P.O. Box 800–211, Shanghai 201800, Peoples Republic of China
Yueling Li
Affiliation:
Shanghai Institute of Optics and Fine Mechanics, Academia Sinica, P.O. Box 800–211, Shanghai 201800, Peoples Republic of China
Pinzhong Fan
Affiliation:
Shanghai Institute of Optics and Fine Mechanics, Academia Sinica, P.O. Box 800–211, Shanghai 201800, Peoples Republic of China
Lihuang Lin
Affiliation:
Shanghai Institute of Optics and Fine Mechanics, Academia Sinica, P.O. Box 800–211, Shanghai 201800, Peoples Republic of China
Get access

Abstract

The effect of laser intensity distribution along the line focus on the uniformity of the line-shaped plasmas produced is investigated with time-integrated and time-resolved soft X-ray and optical diagnostics. Evident plasma condition nonuniformities along the line focus resulting from nonuniform laser intensity distributions have been observed with a conventional simple line-focusing technique. With a new line-focusing technique producing a uniform laser illumination, a uniform, line-shaped plasma can be obtained. It is also found that nonuniformities under uniform laser illumination occur mostly during laser heating. The line-shaped uniform laser plasma can be used as a large, uniform X-ray source besides its importance in X-ray laser demonstration and amplification. As an application of such line-shaped plasmas as X-ray sources, the no-overcoat 5F X-ray film is calibrated for the first time by a new method in the soft X-ray range from 10–80 A.

Information

Type
Research Article
Information
Laser and Particle Beams , Volume 10 , Issue 4 , December 1992 , pp. 777 - 786
Copyright
Copyright © Cambridge University Press 1992

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

Article purchase

Temporarily unavailable

References

REFERENCES

Burgess, M.D.J. et al. 1985 Phys. Rev. A32, 2899.CrossRefGoogle Scholar
Chen, W.N. et al. 1990 in Proceedings of Conference on Lasers and Electro-Optics, 1990 Technical Digest Series Vol. 7 (Optical Society of America, Washington), p. 282.Google Scholar
Coe, S.E. et al. 1991 Opt. Comm. 81, 47.CrossRefGoogle Scholar
Deng, X.M. et al. 1981 Acta Optica Sinica 1, 261.Google Scholar
Deng, X.M. et al. 1987 Shanghai Institute of Optics and Fine Mechanics, Research Report LF12.Google Scholar
Henke, B.L. et al. 1984 J. Opt. Soc. Am. B1, 818.CrossRefGoogle Scholar
Kieffer, J.C. et al. 1991a Phys. Fluids B3, 463.CrossRefGoogle Scholar
Kieffer, J.C. et al. 1991b Opt. Comm. 84, 208.CrossRefGoogle Scholar
Kruer, W.L. 1988 The Physics of Laser Plasma Interactions (Addision-Wesley, Reading, MA).Google Scholar
Lee, T.N. et al. 1986 Rev. Sci. Instrum. 57, 2052.CrossRefGoogle Scholar
Liang, X.C. et al. 1982 Acta Optica Sinica 2, 113.Google Scholar
Lin, L.H. et al. 1990 Proc. SPIE 1346, 490.CrossRefGoogle Scholar
Wang, X.F. et al. 1991a J. Appl. Phys. 69, 2015.CrossRefGoogle Scholar
Wang, X.F. et al. 1991b Appl. Phys. Lett. 58, 2901.CrossRefGoogle Scholar
Wang, X.F. et al. 1991c Shanghai Institute of Optics and Fine Mechanics, Shanghai, unpublished report.Google Scholar
Wang, S.J. et al. 1991d Sci. China 2, 151.Google Scholar
Wang, X.F. et al. 1993 Opt. Engineering, in press.Google Scholar
Xu, Z.Z. et al. 1981 Chin. Phys. 1, 548.Google Scholar
Xu, Z.Z. et al. 1987 Opt. Comm. 61, 199.CrossRefGoogle Scholar
Xu, Z.Z. et al. 1989 Phys. Rev. A 39, 806.Google Scholar
Xu, Z.Z. et al. 1991 in Institute of Physics Conference Series No. 116,Tallents, G.J. ed. (IOP, Bristol, UK), p. 151.Google Scholar
Zhu, Q.C. et al. 1989 J. High Speed Photo. Photon. 18, 47.Google Scholar