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Focused Ion Beam Fabrication of SU-8 Waveguide Structures on Oxidized Silicon

Published online by Cambridge University Press:  23 January 2017

Swagata Samanta,
Pallab Banerji and
Pranabendu Ganguly
Swagata Samanta*
Affiliation:
Advanced Technology Development Centre, Indian Institute of Technology Kharagpur, West Bengal, Kharagpur 721302 , India.
Pallab Banerji
Affiliation:
Materials Science Centre, Indian Institute of Technology Kharagpur, West Bengal, Kharagpur 721302, India.
Pranabendu Ganguly
Affiliation:
Advanced Technology Development Centre, Indian Institute of Technology Kharagpur, West Bengal, Kharagpur 721302 , India.
*
*(Email: swagata@atdc.iitkgp.ernet.in)

Abstract

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This work deals with SU-8 waveguides and waveguide structures fabricated on an oxidized silicon substrate using ‘Focused ion beam (FIB) lithography’. From our experimentation it seems that FIB method is practically not suitable for fabricating long SU-8 waveguide structures, rather it is more suitable for nanoscale modification of already fabricated waveguides, such as, to fabricate photonic crystal structures.

Keywords

polymerion-beam processingnanostructure

Information

Type
Articles
Information
MRS Advances , Volume 2 , Issue 18: Processing and Manufacturing , 2017, pp. 981 - 986
Copyright
Copyright © Materials Research Society 2017 

References

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