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Multi-beam SEM Technology for High Throughput Imaging

Published online by Cambridge University Press:  18 May 2016

Kyle Crosby ,
Anna Lena Eberle  and
Dirk Zeidler
Kyle Crosby*
Affiliation:
Carl Zeiss Microscopy, LLC, 1 Zeiss Drive, Thornwood, NY 10594, U.S.A.
Anna Lena Eberle
Affiliation:
Carl Zeiss Microscopy, GmbH, Carl-Zeiss-Straße 22, 73447 Oberkochen, Germany
Dirk Zeidler
Affiliation:
Carl Zeiss Microscopy, GmbH, Carl-Zeiss-Straße 22, 73447 Oberkochen, Germany
*
*(Email: kyle.crosby@zeiss.com)
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Abstract

Recent developments in a number of fields call for high-throughput, high-resolution imaging of large areas. Examples are reconstruction of macroscopic volumes of mouse brain tissue, or wafer defect inspection. To address these needs, we have developed a multi-beam, single column SEM which utilizes an array of 61 or 91 electron beams and detectors in parallel. The total possible detection speed of the multiple beam SEM is the single detection speed times the number of beams. In the same time a single beam SEM creates an image of several million pixels size, the multi-beam SEM produces between several hundred million and one billion pixels. Herein we demonstrate the capabilities of generating massive data sets using the multi-beam SEM on a variety of samples including brain tissue serial sections and semiconductor test wafers.

Keywords

scanning electron microscopy (SEM)defectsnanostructure

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Type
Articles
Information
MRS Advances , Volume 1 , Issue 26: Theory, Characterization, and Modeling , 2016 , pp. 1915 - 1920
Copyright
Copyright © Materials Research Society 2016 

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References

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