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Probing nanoscale structure and strain by dark-field x-ray microscopy

Published online by Cambridge University Press:  09 April 2020

Can Yildirim
Affiliation:
CEA-Leti, France; canyildirim.mete@gmail.com
Phil Cook
Affiliation:
Institute for Materials Science and Physics, University of Natural Resources and Life Sciences, Austria; phil.cook@boku.ac.at
Carsten Detlefs
Affiliation:
European Synchrotron Radiation Facility, France; detlefs@esrf.fr
Hugh Simons
Affiliation:
Department of Physics, Technical University of Denmark, Denmark; husimo@fysik.dtu.dk
Henning Friis Poulsen
Affiliation:
Department of Physics, Technical University of Denmark, Denmark; hfpo@fysik.dtu.dk
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Abstract

Dark-field x-ray microscopy is intended for the acquisition of three -dimensional (3D) movies of the nanostructure (grains, domains, and dislocations) and the associated local strain within bulk materials. It is analogous to dark-field electron microscopy in that an objective lens magnifies diffracting features of the sample. The use of high-energy synchrotron x-rays, however, means that these microstructural features can be large and deeply embedded. The spatial and angular resolution is on the order of 100 nm and 0.001°, respectively, and full maps can be recorded in seconds to minutes. Four applications of the technique are presented—domain switching in ferroelectrics, processing of metals, microstructural characterization of biominerals, and visualization of dislocations. The ability to directly characterize complex, multiscale phenomena in situ—and in 3D—is a key step toward formulating and validating multiscale models that account for the entire heterogeneity of materials.

Information

Type
Nanoscale Tomography Using X-rays and Electrons
Copyright
Copyright © Materials Research Society 2020

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