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Atomic Layer CVD for Continuously Shrinking Devices

Published online by Cambridge University Press:  17 March 2011

Suvi Haukka,
Kai-Erik Elers and
Marko Tuominen
Suvi Haukka
Affiliation:
ASM Microchemistry Ltd., Kutojantie 2B, P.O. Box 132, FIN-02631 Espoo, Finland
Kai-Erik Elers
Affiliation:
ASM Microchemistry Ltd., Kutojantie 2B, P.O. Box 132, FIN-02631 Espoo, Finland
Marko Tuominen
Affiliation:
ASM Microchemistry Ltd., Kutojantie 2B, P.O. Box 132, FIN-02631 Espoo, Finland
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Abstract

This paper will review the basics of the atomic layer chemical vapor deposition (ALCVD) thin film growth technique. The emphasis is on the ALCVD metal nitride growth and dual damascene barrier requirements.

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