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Dynamics And Morphology Of Cracks In Silicon Nitride Films: A Molecular Dynamics Study On Parallel Computers

Published online by Cambridge University Press:  15 February 2011

Aiichiro Nakano,
Rajiv K. Kalia and
Priya Vashishta
Aiichiro Nakano
Affiliation:
Concurrent Computing Laboratory for Materials Simulations Department of Computer Science Department of Physics and Astronomy Louisiana State University, Baton Rouge, LA 70803
Rajiv K. Kalia
Affiliation:
Concurrent Computing Laboratory for Materials Simulations Department of Computer Science Department of Physics and Astronomy Louisiana State University, Baton Rouge, LA 70803
Priya Vashishta
Affiliation:
Concurrent Computing Laboratory for Materials Simulations Department of Computer Science Department of Physics and Astronomy Louisiana State University, Baton Rouge, LA 70803
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Abstract

Multiresolution molecular dynamics approach on parallel computers has been used to investigate fracture in ceramic materials. In microporous silica, critical behavior at fracture is analyzed in terms of pore percolation and kinetic roughening of fracture surfaces. Crack propagation in amorphous silicon nitride films is investigated, and a correlation between the speed of crack propagation and the morphology of fracture surfaces is observed. In crystalline silicon nitride films, temperature-assisted void formation in front of a crack tip slows down crack propagation.

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