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Electron, Ion and Photon Beam Processing

Published online by Cambridge University Press:  25 February 2011

Kenji Gamo
Kenji Gamo*
Affiliation:
Faculty of Engineering Science and Research Center for Extreme materials, Osaka University, Toyonaka, Osaka 560, Japan
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Abstract

Beam processing techniques are increasingly important because of their unique capability as nano-device fabrication techniques. These are low temperature processing, high spacial resolution, high material and spacial selectivity and anisotropy, etc. For device fabrication, reduction of processinduced damage is crucial. In the present paper, basic characteristics of electron, ion and photon beam processing for etching and deposition are compared with putting emphasize on the effect of damage and promising techniques to minimize damage.

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