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Experimental Methods and Data Analysis for Fluctuation Microscopy

Published online by Cambridge University Press:  10 February 2011

P. M. Voyles,
M. M. J. Treacy,
J. M. Gibson,
H-C. Jin and
J. R. Abelson
P. M. Voyles
Affiliation:
Dept. of Physics, University of Illinois, Urbana, IL 61801, pvoyles@uiuc.eduNEC Research Institute, Princeton, NJ 08540
M. M. J. Treacy
Affiliation:
NEC Research Institute, Princeton, NJ 08540
J. M. Gibson
Affiliation:
Argonne National Laboratory, Argonne, IL 60439
H-C. Jin
Affiliation:
Dept. of Materials Science and Engineering and Coordinated Science Laboratory, University of Illinois, Urbana, IL 61801
J. R. Abelson
Affiliation:
Dept. of Materials Science and Engineering and Coordinated Science Laboratory, University of Illinois, Urbana, IL 61801
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Abstract

We have developed a new electron microscopy technique called fluctuation microscopy which is sensitive to medium-range order in disordered materials. The technique relies on quantitative statistical analysis of low-resolution dark-field electron micrographs. Extracting useful information from such micrographs involves correcting for the effects of the imaging system, incoherent image contrast caused by large scale structure in the sample, and the effects of the foil thickness.

Information

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 589 , 1999, 155
Copyright
Copyright © Materials Research Society 2001

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