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Glancing Incidence X-Ray Diffraction of Polycrystalline Thin Films

Published online by Cambridge University Press:  01 February 2011

Brian E. McCandless
Brian E. McCandless*
Affiliation:
Institute of Energy Conversion University of Delaware, Newark, DE 19716
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Abstract

Glancing incidence x-ray diffraction (GIXRD) is a powerful diagnostic tool for nondestructive analysis of thin film materials and structures. GIXRD fundamentals and experimental techniques and results are presented with respect to polycrystalline thin-films. The refraction index and critical incident beam angle are calculated for selected elemental and inorganic compounds. Quantitative GIXRD analysis with Cu Kα radiation is applied to several problems: recrystallization of ultra-thin chemical surface deposited CdS films; compositional grading in CuIn1-xGaxSe2 films; formation of native oxides on CdTe films; interdiffusion between CdTe and CdS; Te film thickness determination on etched CdTe; and correlation of inplane residual stress with deposition conditions for sputtered Mo films.

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