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Innovative gold nanoparticle patterning and selective metallization

Published online by Cambridge University Press:  29 May 2013

E.S. Kooij ,
M.A. Raza  and
H.J.W. Zandvliet
E.S. Kooij
Affiliation:
Physics of Interfaces and Nanomaterials, MESA+ Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500AE Enschede, The Netherlands
M.A. Raza
Affiliation:
Physics of Interfaces and Nanomaterials, MESA+ Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500AE Enschede, The Netherlands Centre of Excellence in Solid State Physics, University of the Punjab, QAC, Lahore-54590, Pakistan
H.J.W. Zandvliet
Affiliation:
Physics of Interfaces and Nanomaterials, MESA+ Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500AE Enschede, The Netherlands
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Abstract

We present a simple, novel procedure to selectively deposit gold nanoparticles using pure water. It enables patterning of nanoparticle monolayers with a remarkably high degree of selectivity on flat as well as microstructured oxide surfaces. We demonstrate that water molecules form a thin ‘capping’ layer on exposed thiol molecules within the mercaptan self-assembled layer. This reversible capping of water molecules locally ‘deactivates’ the thiol groups, therewith inhibiting the binding of metallic gold nanoparticles to these specific areas. In addition, we show that this amazing role of water molecules can be used to selectively metalize the patterned gold nanoparticle arrays. Employing an electroless seeded growth process, the isolated seeds are enlarged past the percolation threshold to deposit conducting metal layers.

Keywords

Aunanoscalecolloid

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References

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