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Ionization Radiation Effects And Mechanisms

Published online by Cambridge University Press:  15 February 2011

Yuli Vladimirsky,
John D. Scott and
Pradeep K. Bhattacharya
Yuli Vladimirsky
Affiliation:
Center for Advanced Microstructures and Devices, Louisiana State University, Baton Rouge, LA 70803.
John D. Scott
Affiliation:
Center for Advanced Microstructures and Devices, Louisiana State University, Baton Rouge, LA 70803.
Pradeep K. Bhattacharya
Affiliation:
Center for Advanced Microstructures and Devices, Louisiana State University, Baton Rouge, LA 70803.
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Abstract

A systematic approach for predicting radiation stability of materials and devices is presented. The conceptual basis is a consideration of the radiolysis potentially occurring in x-ray-irradiated materials as a multi-stage process: a) primary radiation excitations (PRE); b) secondary generation of isolated electronic and structural defects resulting from PRE relaxation; and c) interaction, accumulation, and coagulation of defects resulting in change of device electronic properties and in degradation of optical material. This predictive technique involves specific relevant information in a relatively simple context for the purpose of modeling the radiolysis process. It should find general application in selecting materials for x-ray optical elements such as masks, filters, windows where resistance to radiolysis is required as well as for photoresists where radiolytic sensitivity is necessary.

Information

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 306: Symposium K – Materials Aspects of X-Ray Lithography , 1993, 21
Copyright
Copyright © Materials Research Society 1993

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