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Local Atomic Interdiffusion in CdTe/HgCdTe Multilayered Structures

Published online by Cambridge University Press:  26 February 2011

Y. Kim,
A. Ourmazd,
R. D. Feldman,
J. A. Rentschler,
D. W. Taylor and
R. F. Austin
Y. Kim
Affiliation:
AT&T Bell Laboratories, Holmdel, NJ 07733
A. Ourmazd
Affiliation:
AT&T Bell Laboratories, Holmdel, NJ 07733
R. D. Feldman
Affiliation:
AT&T Bell Laboratories, Holmdel, NJ 07733
J. A. Rentschler
Affiliation:
AT&T Bell Laboratories, Holmdel, NJ 07733
D. W. Taylor
Affiliation:
AT&T Bell Laboratories, Holmdel, NJ 07733
R. F. Austin
Affiliation:
AT&T Bell Laboratories, Holmdel, NJ 07733
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Abstract

We combine chemical lattice imaging with digital pattern recognition to study atomic interdiffusion at individual CdTe/HgCdTe interfaces in multi-quantum well structures. In this way we obtain quantitative composition profiles for “as grown” samples, and investigate their development as a function of annealing temperature. Our results indicate that interdiffusion depends on the position of the quantum well with respect to the surface, beginning first at quantum wells close to the surface, and proceeding towards the substrate. Our approach allows the quantification of interdiffusion as a function of time, temperature, and distance from the surface. The implications of these results for the stability of CdTe/HgCdTe structures, and the interpretation of X-ray data are discussed.

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References

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