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Materials Science Issues of Plasma Source Ion Implantation

Published online by Cambridge University Press:  21 February 2011

M. Nastasi,
A.A. Elmoursi,
R.J. Faehl,
A.H. Hamdi,
I. Henins,
G.W. Malaczynski,
J.V. Mantese,
C. Munson,
X. Qui and
W.A. Reass
...Show all authors
M. Nastasi
Affiliation:
Los Alamos National Laboratory, Los Alamos, NM 87545
A.A. Elmoursi
Affiliation:
General Motors Corporation, Research and Development Center, 30500 Mound Rd., Warren, MI 48090–9055
R.J. Faehl
Affiliation:
Los Alamos National Laboratory, Los Alamos, NM 87545
A.H. Hamdi
Affiliation:
General Motors Corporation, Research and Development Center, 30500 Mound Rd., Warren, MI 48090–9055
I. Henins
Affiliation:
Los Alamos National Laboratory, Los Alamos, NM 87545
G.W. Malaczynski
Affiliation:
General Motors Corporation, Research and Development Center, 30500 Mound Rd., Warren, MI 48090–9055
J.V. Mantese
Affiliation:
General Motors Corporation, Research and Development Center, 30500 Mound Rd., Warren, MI 48090–9055
C. Munson
Affiliation:
Los Alamos National Laboratory, Los Alamos, NM 87545
X. Qui
Affiliation:
General Motors Corporation, Research and Development Center, 30500 Mound Rd., Warren, MI 48090–9055
W.A. Reass
Affiliation:
Los Alamos National Laboratory, Los Alamos, NM 87545
DJ. Rej
Affiliation:
Los Alamos National Laboratory, Los Alamos, NM 87545
J.T. Scheuer
Affiliation:
Los Alamos National Laboratory, Los Alamos, NM 87545
CE. Speck
Affiliation:
General Motors Corporation, Research and Development Center, 30500 Mound Rd., Warren, MI 48090–9055
K.C. Walter
Affiliation:
Los Alamos National Laboratory, Los Alamos, NM 87545
B.P. Wood
Affiliation:
Los Alamos National Laboratory, Los Alamos, NM 87545
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Abstract

Ion beam processing, including ion implantation and ion beam assisted deposition (IBAD), are established surface modification techniques which have been used successfully to synthesize materials for a wide variety of tribological applications. In spite of the flexibility and promise of the technique, ion beam processing has been considered too expensive for mass production applications. However, an emerging technology, Plasma Source Ion Implantation (PSII), has the potential of overcoming these limitations to become an economically viable tool for mass industrial applications. In PSII, targets are placed directly in a plasma and then pulsed-biased to produce a non-line-of-sight process for intricate target geometries without complicated fixturing. If the bias is a relatively high negative potential (20-100kV) ion implantation will result. At lower voltages (50-1200V), deposition occurs. Potential applications for PSII are in low-value-added products such as tools used in manufacturing, orthopedic devices, and the production of wear coatings for hard disk media. This paper will focus on the technology and materials science associated with PSII.

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