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Microstructure and Gmr in (111) Sputter-Deposited Co/Cu Multilayers

Published online by Cambridge University Press:  15 February 2011

R.J. Pollard,
M.J. Wilson and
P.J. Grundy
R.J. Pollard
Affiliation:
Now at Department of Pure and Applied Physics, the Queen's University of Belfast, Belfast BT7 INN, UK
M.J. Wilson
Affiliation:
Joule Laboratory, Department of Physics, University of Salford, Salford M5 4WT, UK
P.J. Grundy
Affiliation:
Joule Laboratory, Department of Physics, University of Salford, Salford M5 4WT, UK
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Abstract

This paper presents the results of giant magnetoresistance (GMR), magnetic and microstructural investigations of sputter-deposited Co/Cu multilayers. The multilayers were designed to be at the second maximum of the oscillatory exchange coupling and were deposited onto a range of ion beam irradiated (111) Si substrates giving a transition from a random orientation to a highly oriented (111) texture. The randomly oriented multilayers exhibited mixed coupling and ∼20% GMR, which had components arising from irreversible and reversible magnetization changes, whereas the highly oriented (111) multilayers were almost completely ferromagnetically coupled and showed very little GMR.

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