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Microstructure - Roughness Interelation in Ru/C and Ru/B4C X-RAY Multilayers

Published online by Cambridge University Press:  25 February 2011

Tai D. Nguyen,
Ronald Gronsky and
Jeffrey B. Kortricht
Tai D. Nguyen
Affiliation:
Center for X-Ray Optics, MS 2–400, Lawrence Berkeley Laboratory, Berkeley, CA 94720.Department of Materials Science and Mineral Engineering, and Applied Science & Technology, University of California, Berkeley, CA 94720.
Ronald Gronsky
Affiliation:
National Center for Electron Microscopy, Lawrence Berkeley Laboratory, Berkeley, CA 94720.Department of Materials Science and Mineral Engineering, and Applied Science & Technology, University of California, Berkeley, CA 94720.
Jeffrey B. Kortricht
Affiliation:
Center for X-Ray Optics, MS 2–400, Lawrence Berkeley Laboratory, Berkeley, CA 94720.
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Abstract

X-ray specular and non-specular scattering, and high-resolution transmission electron microscopy (HRTEM) were performed to study the evolution of the microstructures and interfacial roughness in Ru/C and RU/B4C multilayers upon annealing. The microstructure of the approximately 1.4 nm thick Ru layers in the as-prepared 3.5 nm period multilayers is predominantly amorphous. The Ru layers in the Ru/B4C multilayer show RuB2 nano-crystallites after annealing at 600°C for one hour, while those in the Ru/C multilayer crystallize to form hexagonal Ru crystallites. Cross-sectional HRTEM of the annealed Ru/C multilayer also shows agglomeration of the Ru layers. Non-specular measurements of the Ru/C multilayers indicate an enhanced uncorrelated roughness upon annealing. The diffuse component in the as-prepared and annealed RU/B4C multilayers shows insignificant changes. The increase in interfacial roughness in the Ru/C multilayer results from agglomeration of the Ru after annealing, consistent with HRTEM observation.

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