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Nanoelectrode Lithography

Published online by Cambridge University Press:  01 February 2011

Atsushi Yokoo,
Hideo Namatsu and
Masatoshi Oda
Atsushi Yokoo
Affiliation:
yokoo@nttbrl.jp, NTT Basic Research Laboratories, Optical Science Laboratory, 3-1, Morinosato Wakamiya, Atsugi-shi, Kanagawa Pref.,, Atsugi-Shi, 243-0198, Japan, +81-46-240-3205, +81-46-240-4305
Hideo Namatsu
Affiliation:
hideo.namatsu@ntt-at.co.jp, NTT Advanced Technology Corporation, 3-1, Morinosato Wakamiya, Atsugi-shi, 243-0198, Japan
Masatoshi Oda
Affiliation:
oda@nanofab.ntt-at.co.jp, NTT-AT Nanofabrication Corporation, 3-1, Morinosato Wakamiya, Atsugi-shi, 243-0198, Japan
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Abstract

Nanoelectrode lithography is a pattern duplication method which combine template and electrochemical reaction. With the nanoelectrode lithography, electrochemical reaction occurs along with the conductive area of the template, and oxide pattern can be directly fabricated on a surface of semiconductor or metal layer. This "Resist-less patterning" method may have advantage for precise patterning in the future.

Keywords

lithography (removal)nanostructureoxidation

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References

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