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Nanostructure Fabrication Using Electron Beam

Published online by Cambridge University Press:  10 February 2011

Shinji Matsui
Shinji Matsui*
Affiliation:
Laboratory of Advanced Science and Technology for Industry, Himeji Institute of Technology 3–1–2 Koto, Kamigori, Ako, Hyogo 678–1205, JAPAN, matsui@lasti.himeji-tech.ac.jp
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Abstract

Nanofabrication strategies developed by using electron beam (EB) are described. Ten-nm structures of organic positive and negative resist patterns have been achieved by using a commercially available EB lithography system. As one of the applications of EB nanolithography to nanodevices, an electrically variable shallow junction MOSFET (EJ-MOS) is described. As a novel approach, material-wave nanotechnology using de Broglie wave has been developed. Line and dot patterns with 100-nm periodicity were exposed on a PMMA resist by EB holography with a thermal field-emitter gun and an electron biprism. This technique allows us to produce nanoscale periodic patterns. Furthermore, the possibility of nanostructure fabrication by atomic-beam holography has been demonstrated by using a laser-trap technique and a computer-generated hologram made by EB lithography.

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Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 584 , 1999, 293
Copyright
Copyright © Materials Research Society 2000

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