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Platinum Nanostructure Growth Using Self-Assembled Fluorocarbon Structure

Published online by Cambridge University Press:  01 February 2011

Sang Hwui Lee
Affiliation:
lees@rpi.edu, Rensselaer Polytechnic Institute, Center for Integrated Electronics, 110 8th St., RPI, CII 6231, Troy, NY, 12180, United States, 1-518-276-8003, 1-518-276-8761
Zhengchun Liu
Affiliation:
liuz2@rpi.edu, Rensselaer Polytechnic Institute, Center for Integrated Electronics, Troy, NY, 12180, United States
J. Jay McMahon
Affiliation:
mcmahj@rpi.edu, Rensselaer Polytechnic Institute, Center for Integrated Electronics, Troy, NY, 12180, United States
Jian-Qiang Lu
Affiliation:
luj@rpi.edu, Rensselaer Polytechnic Institute, Center for Integrated Electronics, Troy, NY, 12180, United States
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Abstract

We report on a novel approach to grow platinum (Pt) nanostructure using a self-assembled fluorocarbon structure as a template. A ring-type structure of fluorocarbon residues forms during the reactive ion etching (RIE) of SiO2 using trifluoromethane (CHF3) and oxygen as etching gases. Typical dimensions of the ring-type fluorocarbon structure are found to be ∼50 nm in diameter, ∼10 nm in wall thickness, and ∼50 nm in height in this study. Platinum nanostructure up to 100 nm in height and 50 nm in diameter are grown on the template using a low-cost thin film sputter coater for 3 minutes. The morphology and growth mechanism of fluorocarbon structure and platinum nanostructure are discussed. This work provides a simple approach to platinum nanostructure growth for a fuel-cell application.

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Type
Research Article
Copyright
Copyright © Materials Research Society 2007

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