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Polysilicon Thin Film Transistors

Published online by Cambridge University Press:  21 February 2011

Ichio Yudasaka and
Hiroyuki Ohshima
Ichio Yudasaka
Affiliation:
SEIKO EPSON Corporation, TFT Research Laboratory, Suwa, Nagano, Japan
Hiroyuki Ohshima
Affiliation:
SEIKO EPSON Corporation, TFT Research Laboratory, Suwa, Nagano, Japan
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Abstract

Polysilicon thin film transistors are now in mass production. Key factors of the success are thinner polysilicon film and thermal oxidation. Practical applications of polysilicon thin film transistors have been limited, however, because of high temperature processing. Alternative technologies to thermal oxidation are very low pressure deposition, solid-phase crystallization, laser-annealing and hydrogenation. These technologies are compatible with low temperature processing and will contribute to the advance of polysilicon thin film transistors in the future.

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Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 182: Symposium C – Polysilicon Thin Films and Interfaces , 1990, 333
Copyright
Copyright © Materials Research Society 1990

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