Hostname: page-component-7b7567c8c-2n9c9 Total loading time: 0 Render date: 2026-11-14T23:13:58.229Z Has data issue: false hasContentIssue false
  • English
  • Français

Some Recent Developments in Industrial Ion Implanters

Published online by Cambridge University Press:  25 February 2011

Geoff Ryding
Geoff Ryding*
Affiliation:
Eaton Corporation, Ion Beam Systems Division, Beverly, Massachusetts 01915, U.S.A.
Get access

Abstract

semiconductor doping. This paper surveys some of the equipment developed at Eaton Corporation in response to the proliferation of ion implanted devices. Developments in both high current (~10mA) and medium current (~1mA) implanters will be discussed.

The evolution of dedicated equipment for the production of buried oxide layers (silicon on insulator technology) will also be reviewed.

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

Article purchase

Temporarily unavailable

References

REFERENCES

1. Ryding, G., Springer Series in Electrophysics 10, (1982) 319 Google Scholar
2. Rose, P.H., Faretra, R. and Ryding, G., Proceedings of 5th International Conference on Ion Implantation Equipment and Techniques, Smugglers Notch, Vermont, North-Holland (1984)Google Scholar
3. Robertson, G.I., J. Electrochem. Soc. 122, (1975) 796 CrossRefGoogle Scholar
4. Ryding, G., Nucl. Instr. and Meth. 189, (1981) 239 Google Scholar
5. Ryding, G. and Armstrong, A., Nucl. Instr. and Meth. 189 (1981) 319 CrossRefGoogle Scholar
6. Armstrong, A., Benveniste, V., Farley, M. and Ryding, G., Springer Series in Electrophysics 11 (1983) 155 Google Scholar
7. Ryding, G. and Farley, M., Nucl. Instr. and Meth. 189 (1981) 295 Google Scholar
8. Ryding, G., Springer Series in Electrophysics 11 (1983) 274 Google Scholar
9. Mack, M.E., Ryding, G., Douglas-Hamilton, D.H., Steeples, K., Farley, M., Gillis, V., White, N., Wittkower, A. and Lambracht, R., Proceedings of 5th International Conference on Ion Implantation Equipment and Techniques, Smugglers Notch, Vermont, North-Holland (1984)Google Scholar
10. Guerra, M., Benveniste, V., Ryding, G., Douglas-Hamilton, D.H., Reed, M., Gagne, G., Armstrong, A. and Mack, M., Proceedings of 5th International Conference on Ion Implantation Equipment and Techniques, Smugglers Notch, Vermont, North-Holland (1984)Google Scholar
11. Ruffell, J., et. al. To be PublishedGoogle Scholar