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Superhydrophobic Silicon Surfaces with Low Light Reflectivity

Published online by Cambridge University Press:  31 January 2011

Yonghao Xiu,
Yan Liu,
Dennis W. Hess and
Chingping Wong
Yonghao Xiu
Affiliation:
yxiu@gatech.edu, Georgia Institute of Technology, Chemical and Biomolecular Engineering, 311 Ferst Drive, EST, Atlanta, Georgia, 30332, United States
Yan Liu
Affiliation:
yliu85@gatech.edu, Georgia Institute of Technology, School of Polymer, Textile, Fiber Engineering, Atlanta, Georgia, United States
Dennis W. Hess
Affiliation:
dennis.hess@chbe.gatech.edu, Georgia Institute of Technology, Chemical and Biomolecular Engineering, Atlanta, Georgia, United States
Chingping Wong
Affiliation:
cp.wong@mse.gatech.edu, Georgia Institute of Technology, Atlanta, United States
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Abstract

Creation of superhydrophobic self-cleaning surfaces is an important objective for a variety of applications. Indeed, numerous routes to generate superhydrophobic surfaces have been proposed. In this paper, a facile way of forming superhydrophobic surfaces is reported that uses Au assisted HF/H2O2 etching of silicon wafers. The Au layer was deposited onto a silicon wafer via e-beam evaporation. By controlling the evaporation and etching times, the surface roughness can be manipulated and superhydrophobic surfaces with reduced light reflection can be generated. Contact angles were measured with a CCD camera equipped goniometer; these values determined the water repellency. Light reflection on the as prepared black surfaces was measured to assess the efficiency for low cost solar cell applications. This approach offers a new way both to theoretically study the surface roughness effect and to investigate engineering applications of self-cleaning surfaces in solar cells, MEMS, anti-bacteria coating, and microfluidic devices.

Keywords

photovoltaicnanostructureSi

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