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Surface Roughness in Kinetic Growth with Diffusion

Published online by Cambridge University Press:  25 February 2011

Hong Yan
Hong Yan*
Affiliation:
Dept. of Materials Science & Engineering, University of Washington, Seattle, WA 98195
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Abstract

The evolution of surface roughness in kinetic growth with diffusion is studied by computer simulation of ballistic deposition with an activated hopping algorithm, in which the deposited particles diffuse on the surface via random walks. The results demonstrate that the KPZ-type scaling dictates the asympototic statistical properties of surface roughness at elevated temperatures, which are consistent with earlier studies. As surface diffusion is crucially dependent on substrate temperature and deposition rate, we show that they play essential roles in determining the morphology of the film.

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References

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