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TEM to Support Magnetic Media Development in YR2000

Published online by Cambridge University Press:  14 March 2011

Warren J. MoberlyChan,
Paul Dorsey,
Tom Nolan,
Michael Alex and
Tom Yamashita
Warren J. MoberlyChan
Affiliation:
ReadRite, Inc., Milpitas, CA
Paul Dorsey
Affiliation:
Signature BioScience, Inc., Burlingham, CA
Tom Nolan
Affiliation:
SJA-LLP, Mountain View, CA
Michael Alex
Affiliation:
Seagate, Inc., San Jose, CA
Tom Yamashita
Affiliation:
Komag, Inc., San Jose, CA
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Abstract

TEM provides fast and statistical support for magnetic recording media development. Turn-around time including sample preparation, data collection and computer analysis is reduced to ∼3 hours. Rapid, systematic TEM analysis is shown to accurately measure crystallographic Orientation Ratio (OR) on mechanically textured media by diffraction analysis; elucidate grain separation by Weak Beam Dark Field Imaging; and determine the crystallographic relationship between cubic-NiAl seed layers and hexagonal cobalt-alloy (Co) layers. Novel evidence for reduction of the number of preferred orientations in sequentially grown epitaxial films is presented, which explains the “2-&-1/4-D isotropic” growth orientation and the high magnetic squareness of Co media grown on nearly randomly oriented “3D-isotropic” NiAl underlayers.

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References

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