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Amorphous Germanium Crystallization Processes in Multi-Pulse Low Power Laser Irradiation

Published online by Cambridge University Press:  15 February 2011

M. Bertolotti,
G. Vitali,
U. Zammit and
M. Marinelli
M. Bertolotti
Affiliation:
Istituto di Fisica Ingegneria-Università Roma, Italy and GREQP and GNSM of CNR, ITALY
G. Vitali
Affiliation:
Istituto di Fisica Ingegneria-Università Roma, Italy and GREQP and GNSM of CNR, ITALY
U. Zammit
Affiliation:
Istituto di Fisica Ingegneria-Università Roma, Italy and GREQP and GNSM of CNR, ITALY
M. Marinelli
Affiliation:
Istituto di Fisica Ingegneria-Università Roma, Italy and GREQP and GNSM of CNR, ITALY
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Abstract

The regrowing features of disordered germanium under low power multi-pulse irradiation are discussed. It is shown that implanted amorphous germanium starts the regrowth from the specimen surface while glow-discharge amorphous material starts from the amorphous-single crystal interface. Evidence against a melting mechanism in the case of multi-pulse irradiation are also presented.

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References

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