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Beryllium-Based Multilayer Structures

Published online by Cambridge University Press:  15 February 2011

D. G. Stearns
Affiliation:
Lawrence Livermore National Laboratory, P.O. Box 808, Livermore CA 94551
K. M. Skulina
Affiliation:
Lawrence Livermore National Laboratory, P.O. Box 808, Livermore CA 94551
M. Wall
Affiliation:
Lawrence Livermore National Laboratory, P.O. Box 808, Livermore CA 94551
C. S. Alford
Affiliation:
Lawrence Livermore National Laboratory, P.O. Box 808, Livermore CA 94551
R. M. Bionta
Affiliation:
Lawrence Livermore National Laboratory, P.O. Box 808, Livermore CA 94551
D. M. Makowiecki
Affiliation:
Lawrence Livermore National Laboratory, P.O. Box 808, Livermore CA 94551
E. M. Gullikson
Affiliation:
Center of X-ray Optics, Lawrence Berkeley Laboratory, CA 94720
R. Soufli
Affiliation:
Center of X-ray Optics, Lawrence Berkeley Laboratory, CA 94720
J. B. Kortright
Affiliation:
Center of X-ray Optics, Lawrence Berkeley Laboratory, CA 94720
J. H. Underwood
Affiliation:
Center of X-ray Optics, Lawrence Berkeley Laboratory, CA 94720
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Abstract

Multilayer (ML) structures composed of Mo-Be, Ru-Be and Rh-Be with bilayer periods of - 6 nm have been grown using dc magnetron sputter deposition. The ML microstructure has been characterized using x-ray diffraction and high-resolution transmission electron microscopy, and the normal incidence reflectivity has been measured at soft x-ray wavelengths.

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