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A Comparative Study Between high and low Temperature ThermallyControlled Crystallization of thin films

Published online by Cambridge University Press:  15 February 2011

Richard D. Robinson and
Ioannis N. Miaoulis
Richard D. Robinson
Affiliation:
Thermal Analysis of Materials Processing Laboratory, Mechanical Engineering Department, Tufts University, Medford, MA 02155
Ioannis N. Miaoulis
Affiliation:
Thermal Analysis of Materials Processing Laboratory, Mechanical Engineering Department, Tufts University, Medford, MA 02155
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Abstract

Numerical simulation of zone-Melting recrystallization (ZMR) was conductedto determine the heat transfer dynamics over a wide range of temperatures.ZMR is a thermal processing technique used to recrystallize Materials.Therefore, the thermal effects induced by the ZMR process critically affectthe crystallization dynamics. Parametric studies indicated that theconductive heat flux from the heat source through the gas accounted for atleast 15% of the total energy heating the film for materials with meltingpoints less than 800°C. The influence of this conductive heating has beenneglected in past analyses. Also, Materials with higher melting points areless sensitive to changes in the heat flux from the heat source. Slightvariations of thermal gradients in the film can lead to different qualitiesof crystal, so care must be taken when processing materials with lowermelting points, since they are more sensitive to temperature variation. Thispaper analyzes the dominant modes of heat transfer in ZMR over a wide rangeof temperatures that influence the recrystallization dynamics.

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References

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