Hostname: page-component-6898cfcb55-w5hgh Total loading time: 0 Render date: 2026-11-11T11:46:49.315Z Has data issue: false hasContentIssue false
  • English
  • Français

Computationally Efficient Model for 2D Ion Implantation Simulation

Published online by Cambridge University Press:  10 February 2011

Misha Temkin and
Ivan Chakarov
Misha Temkin
Affiliation:
SILVACO International, Inc. 4701 Patrick Henry Dr. Bldg.2, Santa Clara, CA 95054
Ivan Chakarov
Affiliation:
SILVACO International, Inc. 4701 Patrick Henry Dr. Bldg.2, Santa Clara, CA 95054
Get access

Abstract

A computationally efficient method for ion implantation simulation is presented. The method allows two-dimensional ion implantation profiles in arbitrary shaped structures to be calculated and is valid for both amorphous and crystalline materials. It uses an extension of the one-dimensional dual Pearson approximation into the second dimension.

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

Article purchase

Temporarily unavailable

References

REFERENCES

1. Biersack, J. P. and Eckstein, W.D., Appl. Phys. A34, 73 (1984).Google Scholar
2. Robinson, M.T., Phys. Rev. B40, 10717 (1989).Google Scholar
3. Tasch, A.F., Shin, H., Park, C., Novak, S., J. Electrochem. Soc. 136, 810, (1989).Google Scholar
4. Hobler, G., Langer, E., Selberherr, S., Solid-State Electron. 30, 445 (1987).Google Scholar
5. Bowyer, M.D.J., Ashworth, D. G., Oven, R., J. Phys. D: Appl. Phys. 29, 1274 (1996).Google Scholar
6. Bowyer, M.D.J., Ashworth, D.G., Oven, R., Solid-State Electron. 35, 1151 (1992).Google Scholar
7. Park, C., Klein, K. M., Tasch, A. F., Solid-State Electron. 33, 650 (1990).Google Scholar
8. Chakarov, I. and Webb, R., Radiat. Eff. and Defects in Solids, 130, 447 (1994).Google Scholar
9. Johnson, N.L. and Kotz, S. Distributions in Statistics: Continuous Univariate Distributions vol. 1 (Houghton Mifflin, Boston, 1970).Google Scholar
10. Oven, R., Ashworth, D.G., Bowyer, M.D.J., J. Phys. D: Appl. Phys. 25, 1235 (1992).Google Scholar