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Direct Holographic Processing Using Laser Chemistry

Published online by Cambridge University Press:  21 February 2011

H. H. Gilgen,
D. Podlesnik,
C. J. Chen and
R. M. Osgood Jr
H. H. Gilgen
Affiliation:
Department of Electrical Engineering, Columbia University, New York, NY 10027
D. Podlesnik
Affiliation:
Department of Electrical Engineering, Columbia University, New York, NY 10027
C. J. Chen
Affiliation:
Department of Electrical Engineering, Columbia University, New York, NY 10027
R. M. Osgood Jr
Affiliation:
Department of Electrical Engineering, Columbia University, New York, NY 10027
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Abstract

By using two interfering laser beams to initiate localized chemical reactions at an interface, very high resolution, maskless microfabrication can be done over relatively large substrate areas. The resulting deposited or etched patterns can be used in a variety of electrooptical and electronic applications. In addition, this type of fabrication, which can be monitored in real time, provides insight into many new interfacial phenomena.

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References

REFERENCES

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