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Functional Polymers for Advanced Lithography

Published online by Cambridge University Press:  01 February 2011

Kyung Choi
Kyung Choi*
Affiliation:
choikm@uci.edu, University of California, Chemistry, Irvine, California, 92697, United States
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Abstract

In nanotechnology, many scientists have been seeking for new functional polymers, which can replica nano-sized features to achieve improved performances of nano-devices. Soft lithography has been widely used in replica of small features as a low cost alternative to conventional UV photolithography. However, commercial silicon rubbers, PDMS polymers, which have been used in current soft lithography, show limitations, especially for nano-resolution soft lithography. These limitations have motivated us to develop a new version of PDMS polymers to overcome those limitations and thus to extend current technology in soft lithography to the advanced level. Since the resolution of soft lithography significantly relies on stamping performance, we designed a novel PDMS prepolymer, which has photocurable cross-linkers to enhance mechanical property to improve lithographic performance and also to create photocurable capability.

Keywords

chemical synthesisnanoscalenanostructure

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References

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