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Growth of AlBN Solid Solution by OMVPE

Published online by Cambridge University Press:  10 February 2011

M. Shin,
A. Y. Polyakov,
W. Qian,
M. Skowronski,
D. W. Greve and
R. G. Wilson
M. Shin
Affiliation:
Department of Materials Science & Engineering, Carnegie Mellon University, Pittsburgh, PA 15213–3890
A. Y. Polyakov
Affiliation:
Department of Materials Science & Engineering, Carnegie Mellon University, Pittsburgh, PA 15213–3890
W. Qian
Affiliation:
currently with Department of Materials Science & Engineering, Northwestern University, Evanston, IL 60208
M. Skowronski
Affiliation:
Department of Materials Science & Engineering, Carnegie Mellon University, Pittsburgh, PA 15213–3890
D. W. Greve
Affiliation:
Department of Electrical & Computer Engineering, Carnegie Mellon University, PA 15213–3890
R. G. Wilson
Affiliation:
Hughes Research Laboratory, Malibu, CA 90265
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Abstract

Layers of AIBN were grown on sapphire by organometallic vapor phase epitaxy (OMVPE) at 1050°C using triethylboron (TEB), trimethylaluminum (TMA) and ammonia as precursors. Boron is readily incorporated into the layers and its concentration in the solid phase can be made fairly high, up to at least 40%. However, single phase AIxB1–xN films can only be grown for compositions not exceeding x=0.01. For higher B concentrations a second B-rich phase is formed. This phase is shown to be most probably wurtzite BN based on the results of transmission electron microscopy and x-ray diffraction. The growth of this phase occurs within the framework of wurtzite AIN islands providing the sites for lateral growth of wurtzite BN. This leads to formation of columnar structure of AIN and BN crystallites oriented in the basal plane and existing side by side. This is one of the first observation of purely thermal growth of sp3 bonded BN.

Information

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 449: Symposium N – III-V Nitrides , 1996, 141
Copyright
Copyright © Materials Research Society 1997

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References

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