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Hydrogen Populations in PECVD a-Si:H,D

Published online by Cambridge University Press:  15 February 2011

T. S. Cull,
M. J. Kernan,
P. H. Chan,
P. A. Fedders,
D. J. Leopold,
R. E. Norberg,
P. Wickboldt and
W. Paul
T. S. Cull
Affiliation:
Department of Physics, Washington University, One Brookings Drive, St. Louis, MO 63130, ren@howdy.wustl.edu
M. J. Kernan
Affiliation:
Department of Physics, Washington University, One Brookings Drive, St. Louis, MO 63130, ren@howdy.wustl.edu
P. H. Chan
Affiliation:
Department of Physics, Washington University, One Brookings Drive, St. Louis, MO 63130, ren@howdy.wustl.edu
P. A. Fedders
Affiliation:
Department of Physics, Washington University, One Brookings Drive, St. Louis, MO 63130, ren@howdy.wustl.edu
D. J. Leopold
Affiliation:
Department of Physics, Washington University, One Brookings Drive, St. Louis, MO 63130, ren@howdy.wustl.edu
R. E. Norberg
Affiliation:
Department of Physics, Washington University, One Brookings Drive, St. Louis, MO 63130, ren@howdy.wustl.edu
P. Wickboldt
Affiliation:
Harvard University, Cambridge, MA 02138
W. Paul
Affiliation:
Harvard University, Cambridge, MA 02138
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Abstract

Proton NMR and deuteron NMR (DMR) have been used to measure hydrogen populations in a series of PECVD a-Si:H,D films. The sharp DMR doublet from Si-D is fitted and subtracted out. The residual spectra then show specific signatures for molecular D2 and HD. The fitting procedures yield quantitative measures of Si-bonded and molecular species. A particular comparison is made between a pair of films prepared as the powered and unpowered electrodes in the same plasma deposition. Both silicon-bonded and molecular populations axe significantly different in the two films and correlate with photoresponse products ημT and with IR as well as other materials characterizations.

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References

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