We discuss main degradation mechanisms present in nitride based laser diodes operating in 400-440 nm spectral range. We can clearly divide the aging processes into these occurring on the exposed facets of the device and into the bulk phenomena. Surface processes are predominantly connected with photochemical reactions on the laser mirrors and manifest by the formation of the carbon deposits. The nature of these photochemical reactions resembles very closely the mechanism known as Package Induced Failure observed previously in case of 980 nm laser diodes. Degradation involving bulk like effects is much less understood. The experimental results by other group are not sufficient for proposing an unambiguous model of the physical effects involved. In particular, it consists in observation related to dopants diffusion and recombination mechanisms. Magnesium diffusion from the p-type layers into the active layer was proposed as a possible degradation path. However, our study of SIMS profiles in the device subjected to over 8 000 h of electrical stress reveals no visible modification in the Mg profile. The same holds for the hydrogen spatial distribution thus substantially limiting candidates for the diffusion processes. Nevertheless, it seems that the diffusion mechanism is involved in bulk degradation. The claim is supported by two facts: well confirmed stability of the extended defects network in nitride emitters and characteristic square-root time-dependence of the degradation rate.