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Interface Roughness: What is it and How is it Measured?

Published online by Cambridge University Press:  25 February 2011

E. Chason,
Charles M. Falco,
A. Ourmazd,
E. F. Schubert,
J. M. Slaughter and
R. S. Williams
E. Chason
Affiliation:
Sandia National Laboratories, Albuquerque, NM 87185
Charles M. Falco
Affiliation:
University of Arizona, Optical Sciences Center and Physics Dept., Tucson, AZ 85721
A. Ourmazd
Affiliation:
AT&T Bell Laboratories, Holmdel, NJ 07733–3030
E. F. Schubert
Affiliation:
AT&T Bell Laboratories, Murray Hill, NJ 07974–0636
J. M. Slaughter
Affiliation:
University of Arizona, Optical Sciences Center and Physics Dept., Tucson, AZ 85721
R. S. Williams
Affiliation:
Dept. of Chemistry, Univ. of California, Los Angeles, CA 90024
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Abstract

A panel discussion on interface roughness was held at the Fall 1992 Materials Research Society meeting. We present a summary of the results presented by the invited speakers on the application and interpretation of X-ray reflectivity, atomic force microscopy (AFM), scanning tunneling microscopy (STM), photoluminescence and transmission electron microscopy. A transcript of the moderated discussion is provided in the final section.

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