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Island Structured Dielectric Thin Films by Scalable Self-Assembly

Published online by Cambridge University Press:  01 February 2011

Sharath Sriram,
Madhu Bhaskaran and
Arnan Mitchell
Sharath Sriram
Affiliation:
sharath.sriram@gmail.com, RMIT University, Microelectronics and Materials Technology Centre and Platform Technologies Research Institute, Melbourne, Victoria, Australia
Madhu Bhaskaran
Affiliation:
madhu.bhaskaran@gmail.com, RMIT University, Microelectronics and Materials Technology Centre and Platform Technologies Research Institute, Melbourne, Victoria, Australia
Arnan Mitchell
Affiliation:
arnan.mitchell@rmit.edu.au, RMIT University, Microelectronics and Materials Technology Centre and Platform Technologies Research Institute, Melbourne, Victoria, Australia
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Abstract

A self-assembly driven process to synthesize island-structured dielectric films is presented. An intermetallic reaction in platinized silicon substrates provides preferential growth sites for the complex oxide dielectric (strontium-doped lead zirconate titanate) layer. Microscopy and spectroscopy analyses have been used to propose a mechanism for this structuring process. This provides a simple and scalable process to synthesize films with increased surface area for sensors, especially those materials with a complex chemistry.

Keywords

thin filmself-assemblydielectric

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