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Large Area Mems: Materials Issues and Applications

Published online by Cambridge University Press:  17 March 2011

J.H. Daniel,
R.A. Street,
M. Teepe,
S.E. Ready,
J. Ho,
Y. Wang,
A. Rodkin,
A. Alimonda,
R.B. Apte and
A. Goredema
...Show all authors
J.H. Daniel
Affiliation:
Xerox Palo Alto Research Center, 3333 Coyote Hill Rd, Palo Alto, CA 94304, daniel@parc.xerox.com
R.A. Street
Affiliation:
Xerox Palo Alto Research Center, 3333 Coyote Hill Rd, Palo Alto, CA 94304
M. Teepe
Affiliation:
Xerox Palo Alto Research Center, 3333 Coyote Hill Rd, Palo Alto, CA 94304
S.E. Ready
Affiliation:
Xerox Palo Alto Research Center, 3333 Coyote Hill Rd, Palo Alto, CA 94304
J. Ho
Affiliation:
Xerox Palo Alto Research Center, 3333 Coyote Hill Rd, Palo Alto, CA 94304
Y. Wang
Affiliation:
Xerox Palo Alto Research Center, 3333 Coyote Hill Rd, Palo Alto, CA 94304
A. Rodkin
Affiliation:
Xerox Palo Alto Research Center, 3333 Coyote Hill Rd, Palo Alto, CA 94304
A. Alimonda
Affiliation:
Xerox Palo Alto Research Center, 3333 Coyote Hill Rd, Palo Alto, CA 94304
R.B. Apte
Affiliation:
Xerox Palo Alto Research Center, 3333 Coyote Hill Rd, Palo Alto, CA 94304
A. Goredema
Affiliation:
Xerox Research Center Canada, 2660 Speakman Dr, Mississauga, Ontario, L5K 2L1
D.C. Boils-Boissier
Affiliation:
Xerox Research Center Canada, 2660 Speakman Dr, Mississauga, Ontario, L5K 2L1
P.M. Kazmaier
Affiliation:
Xerox Research Center Canada, 2660 Speakman Dr, Mississauga, Ontario, L5K 2L1
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Abstract

Conventional MEMS devices are based on silicon micro-machining and their maximum size is limited by the wafer. In contrast, we are exploring micro-machining for large area applications on substrates such as glass using polymeric materials. Our research is focused on the photopolymer SU-8, and we apply the MEMS fabrication technology to large area image sensors and displays. There are many challenges concerning the materials and processes, since large area compatibility is essential and integration with large area electronics may be required. The adhesion of SU-8 to the underlying layers as well as stress in the SU-8 are important issues and surface treatments have been investigated. Two applications of SU-8 MEMS are discussed to illustrate large area applications:. First, in the fabrication of an X-ray imager, high aspect ratio SU-8 walls form a micro-patterned phosphor screen to increase the image resolution. Second, a similar approach of patterning SU-8 into arrays of micro-cells is applied to an electrophoretic display.

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References

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