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Liquid-Solid Interface Morphologies and Defect Structures in Zone-Melting-Recrystallized Silicon-On-Insulator Films

Published online by Cambridge University Press:  28 February 2011

J. S. Im,
C. K. Chen,
C. V. Thompson,
M. W. Geis and
H. Tomita
J. S. Im
Affiliation:
Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139
C. K. Chen
Affiliation:
Lincoln Laboratory, Massachusetts Institute of Technology, Lexington, MA 02173
C. V. Thompson
Affiliation:
Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139
M. W. Geis
Affiliation:
Lincoln Laboratory, Massachusetts Institute of Technology, Lexington, MA 02173
H. Tomita
Affiliation:
Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139
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Abstract

In-situ optical microscopy has been used to observe liquid-solid interface morphologies during zone-melting recrystallization of silicon-on-insulator films. These morphologies have been correlated with the defect morphologies of the recrystallized films. Stable cellular solidification fronts, which are obtained at low zone velocities if the radiation intensity gradient in the interfacial region is small, yield subboundary free films. We suggest that under these experimental conditions the interface morphology is primarily the result of radiative heating rather than constitutional supercooling.

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