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A Low Temperature CVD Process for TiN Coatings

Published online by Cambridge University Press:  21 February 2011

A. Aguero,
D. Little and
P. Lowden
A. Aguero
Affiliation:
Liburdi Engineering Limited, 400 Hwy 6 N., Hamilton, Ontario, Canada, L9J 1E7
D. Little
Affiliation:
Liburdi Engineering Limited, 400 Hwy 6 N., Hamilton, Ontario, Canada, L9J 1E7
P. Lowden
Affiliation:
Liburdi Engineering Limited, 400 Hwy 6 N., Hamilton, Ontario, Canada, L9J 1E7
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Abstract

A novel low temperature process for the chemical vapour deposition of titanium nitride films has been developed. Titanium sub-halides generated “in situ” by chlorination of titanium pellets are subsequently reacted with ammonia at reduced pressure and temperatures of 450–600° C. The coatings have excellent adhesion and wear resistance. A description of the process and the properties of the coatings produced by it will be presented.

Information

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 168 , 1989, 311
Copyright
Copyright © Materials Research Society 1990

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References

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