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Metastable Structures Formed in Plasma Source Ion Processing

Published online by Cambridge University Press:  25 February 2011

Xiao-Ci zheng
Affiliation:
Materials Science Center & Plasma Source Ion Implantation Group, University of Wisconsin-Madison, Madison, WI 53706
R. A. Dodd
Affiliation:
Materials Science Center & Plasma Source Ion Implantation Group, University of Wisconsin-Madison, Madison, WI 53706
J. R. Conrad
Affiliation:
Materials Science Center & Plasma Source Ion Implantation Group, University of Wisconsin-Madison, Madison, WI 53706
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Abstract

Ni-Ti films were bombarded by plasma source heavy ions of different ion dose and ion flux. Disc-like non-uniform microstructures were found when the films were irradiated at a dose of 5x1016Kr+/cm2. These “discs” were acting as defect centers. The development of “discs” depended on the plasma ion flux during the pulse. Target geometry appeared to have effects on the density of “discs”.

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Type
Research Article
Copyright
Copyright © Materials Research Society 1990

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