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Micro-patterned NiFeMo Magnetoimpedance Multilayer for Magnetic Sensor Application

Published online by Cambridge University Press:  26 February 2011

Duhyun Lee
Affiliation:
duhyun@skku.edu, Sungkyunkwan University, Dep. of Advanced Materials Engineering, 300, Chunchun-dong, Suwon, Gyonggi, 440-746, Korea, Republic of, +82-31-290-7373, +82-31-290-5644
G.H. Jeong
Affiliation:
skk94@skku.edu, Sungkyunkwan University, Dept. of Advanced Materials Engineering, Korea, Republic of
J.H. Kim
Affiliation:
saw999@skku.edu, Sungkyunkwan University, Dept. of Advanced Materials Engineering, Korea, Republic of
Y.S. Kim
Affiliation:
youngsk@skku.edu, Sungkyunkwan University, Dept. of Advanced Materials Engineering
S.J. Suh
Affiliation:
suhsj@skku.ac.kr, Sungkyunkwan University, Dept. of Advanced Materials Engineering
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Abstract

As an alternative to the magnetoimpedance (MI) devices made from amorphous ribbon or wire, this study proposed a thin film type MI device composed with Ag conductive core and soft ferromagnetic NiFeMo sandwich layers. Obtained optimum sandwich structure was Ta 5 nm/ NiFeMo 300 nm/ Ta 5 nm/ Ag 900 nm/ Ta 5 nm/ NiFeMo 300 nm/ Ta 5 nm, and the width of Ag as 20 µm and the width of NiFeMo as 100 µm. It was patterned by using photolithography and lift-off process. The sandwich structure showed the maximum MI ratio about 40% at the 15 MHz. The impedance change was linear and nearly reversible at the external magnetic field region below the anisotropy field.

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Type
Research Article
Copyright
Copyright © Materials Research Society 2006

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