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Molecular Sieve Thin Films via Laser Ablation

Published online by Cambridge University Press:  15 February 2011

Kenneth J. Balkus Jr.,
Scott J. Riley and
Bruce E. Gnade
Kenneth J. Balkus Jr.
Affiliation:
University of Texas at Dallas, Department of Chemistry, Richardson, TX 75083-0688
Scott J. Riley
Affiliation:
University of Texas at Dallas, Department of Chemistry, Richardson, TX 75083-0688
Bruce E. Gnade
Affiliation:
Materials Science Laborartory, Semiconductor Research and Development, Texas Instruments, Inc., Dallas, TX 75265
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Abstract

Laser ablation has become widely recognized as an effective technique for the preparation of thin solid films. We have employed an excimer laser (KrF, 248 nm) to deposit well dispersed thin films of aluminum phosphate molecular sieves on a titanium nitride substrate. Results for the ablation of AIPO4-5, AIPO4-H3 and AIPO4-H1 molecular sieve targets are presented. The laser power and repetition rate as well as substrate distance and temperature affect the thin film formation. A subsequent hydrothermal post treatment of the ablated films was found to enhance the surface crystallinity. The molecular sieve thin films were characterized by XRD, SEM, XRF, and FT-IR spectroscopy.

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References

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