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Morphological changes of Branched Ge Clusters caused by Diffusion Fields and Surface Roughness of Au Underlayer

Published online by Cambridge University Press:  10 February 2011

A. Sugawara
Affiliation:
Department of Metallurgical Engineering, Tokyo Institute of Technology, Oh-okayama 2-12-1, Meguro-ku, Tokyo 152, Japan.
T. Kikukawa
Affiliation:
Department of Metallurgical Engineering, Tokyo Institute of Technology, Oh-okayama 2-12-1, Meguro-ku, Tokyo 152, Japan.
Y. Haga
Affiliation:
Department of Metallurgical Engineering, Tokyo Institute of Technology, Oh-okayama 2-12-1, Meguro-ku, Tokyo 152, Japan.
O. Nittono
Affiliation:
Department of Metallurgical Engineering, Tokyo Institute of Technology, Oh-okayama 2-12-1, Meguro-ku, Tokyo 152, Japan.
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Abstract

The formation of polycrystalline Ge clusters, during annealing of amorphous Ge/polycrystalline Au bilayers, has been studied by in-situ transmission and scanning electron microscopy. The experimentally observed generation of branching patterns, and the evolution mechanism of branches, are discussed on the basis of finite diffusion length aggregation simulations.

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